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POLYSULFONES AS X-RAY RESISTS: The Radiation Induced Degradation of Poly(diene sulfones) and Their Application in X-ray Lithography - Softcover
The microlithographic process, essential in the fabrication of microdevices, uses high-energy radiation to transfer a pattern onto a thin film of polymer resist. Pattern transfer occurs by modifying the properties (solubility or volatility) of the polymer film exposed to radiation. Poly(olefin sulfones) exhibit a high sensitivity to x-rays, which is a desirable property for polymer resists used in the microlithographic process. The potential utility of these new resins prompted a study of the mechanism of degradation promoted by x- ray radiation. In this study, the effect of x-ray radiation on polysulfones with varied chemical structures was analyzed using x-ray absorption near- edge structure (XANES) spectroscopy and in-situ mass spectroscopy (MS). Interesting differences in the mode of degradation of certain poly(olefin sulfones) was observed. The results provide important groundwork for further studies of polysulfones as x- ray resists.
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Gina graduated from Louisiana State University with a B.S. in Microbiology in 1995 and a M.S. in Chemistry in 2002. She has worked in the fields of x-ray microlithography, protein crystallography and molecular pharmacology. She is now a Mission Support Scientist at NASA Johnson Space Center since 2007.
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- PublisherVDM Verlag
- Publication date2009
- ISBN 10 3639166485
- ISBN 13 9783639166484
- BindingPaperback
- Number of pages60
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POLYSULFONES AS X-RAY RESISTS: The Radiation Induced Degradation of Poly(diene sulfones) and Their Application in X-ray Lithography
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POLYSULFONES AS X-RAY RESISTS
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Book Description Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The microlithographic process, essential in the fabrication of microdevices, uses high-energy radiation to transfer a pattern onto a thin film of polymer resist. Pattern transfer occurs by modifying the properties (solubility or volatility) of the polymer film exposed to radiation. Poly(olefin sulfones) exhibit a high sensitivity to x-rays, which is a desirable property for polymer resists used in the microlithographic process. The potential utility of these new resins prompted a study of the mechanism of degradation promoted by x-ray radiation. In this study, the effect of x-ray radiation on polysulfones with varied chemical structures was analyzed using x-ray absorption near-edge structure (XANES) spectroscopy and in-situ mass spectroscopy (MS). Interesting differences in the mode of degradation of certain poly(olefin sulfones) was observed. The results provide important groundwork for further studies of polysulfones as x-ray resists. 60 pp. Englisch. Seller Inventory # 9783639166484
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POLYSULFONES AS XRAY RESISTS The Radiation Induced Degradation of Polydiene sulfones and Their Application in Xray Lithography
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POLYSULFONES AS X-RAY RESISTS : The Radiation Induced Degradation of Poly(diene sulfones) and Their Application in X-ray Lithography
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Book Description Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - The microlithographic process, essential in the fabrication of microdevices, uses high-energy radiation to transfer a pattern onto a thin film of polymer resist. Pattern transfer occurs by modifying the properties (solubility or volatility) of the polymer film exposed to radiation. Poly(olefin sulfones) exhibit a high sensitivity to x-rays, which is a desirable property for polymer resists used in the microlithographic process. The potential utility of these new resins prompted a study of the mechanism of degradation promoted by x-ray radiation. In this study, the effect of x-ray radiation on polysulfones with varied chemical structures was analyzed using x-ray absorption near-edge structure (XANES) spectroscopy and in-situ mass spectroscopy (MS). Interesting differences in the mode of degradation of certain poly(olefin sulfones) was observed. The results provide important groundwork for further studies of polysulfones as x-ray resists. Seller Inventory # 9783639166484
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POLYSULFONES AS X-RAY RESISTS
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Book Description Kartoniert / Broschiert. Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Calderon Wilkinson GinaGina graduated from Louisiana State University with a B.S. in nMicrobiology in 1995 and a M.S. in Chemistry in 2002. She has nworked in the fields of x-ray microlithography, protein ncrystallography and molecul. Seller Inventory # 4963425
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